
Photomask Fabrication
$500 for high-resolution glass photomask and metrology QC report
Photomasks Overview
We provide high-precision chrome photomasks designed for research, prototyping, and advanced microfabrication applications, including microfluidics, MEMS, photonics, and biomedical devices. Our masks are fabricated with tight dimensional control to support sub-micron pattern fidelity and reliable lithographic performance.

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Product: High-Precision Chrome Photomask
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Mask Size / Thickness: 101.6 × 101.6 × 2.3 mm (4″ × 4″ × 0.09″)
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Minimum Line Width: ≥ 1 µm
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Line Width Accuracy: ± 0.15 µm
Our engineering team can help prepare your design for fabrication, including layer extraction, feature biasing, tone reversal, optical proximity correction (OPC), and data verification. We support all standard file formats such as GDSII, OASIS, DXF, and Gerber to ensure your mask is fully production-ready.
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PDMS · Injection Molding · MEMS - One Partner
6195 Cornerstone Ct East, Suite 105, San Diego, CA 92121
858.688.0000
